MProbe 50 - in-situ film thickness monitoring
An in-situ optical thickness monitor that measures thin-film thickness and optical constants (n, k) in real time - right inside the deposition chamber. Gated acquisition lets it work in high-ambient-light environments, and there are no moving parts.
Overview
MProbe® 50 is an in-situ, real-time optical thickness monitor for thin-film thickness and n, k. Because it uses gated data acquisition with a high-intensity Xe flash lamp, it measures accurately across a broadband UV–NIR range even in the high-ambient-light conditions found inside a deposition chamber. With no moving parts and a typical measurement time of ~10 ms, practically any translucent film can be measured quickly and reliably.
Flexible chamber integration
The system is fully customizable to different vacuum-chamber geometries. Depending on the optical ports available, it can use oblique or normal incidence, and light can be focused on the sample surface or collimated. The reflectance probe can sit outside the chamber's optical port or inside it, using a fiber-optic feedthrough.
Why MProbe 50
- In-situ thin-film thickness and n, k measurement
- Gated data acquisition for high-ambient-light environments
- 500+ material library
- Continuous, fast and reliable measurement (~10 ms typical)
- Fully customized to match your deposition-chamber geometry
A fiber-optic adapter is available for integration with the optical port of a vacuum chamber. For post-deposition verification, the in-situ monitor pairs naturally with a desktop MProbe UVVis system.
Monitoring a deposition process?
Share your chamber geometry and available optical ports - we'll design an in-situ configuration to match.